So far, the value of W depends both on the properties of the ma

So far, the value of W depends both on the properties of the material (�� and NB) as well as on the amount of adsorbed species that creates surface states and thus a surface barrier. Typical values ranges from a few nm to a few tens of nm [4].In n-type semiconductors, such as SnO2, WO3 or ZnO, such an upward band bending will lead to a conductance decrease, while it will decrease the conductance of p-type semiconductors, such as CuO or NiO.The further interaction of gaseous molecules with the aforementioned active ions modulates their population over the semiconductor surface and thus the electrical properties of the material.

According to this mechanism, reducing gases, such as CO and hydrocarbons, get oxidized reacting with oxygen ions and their population over the oxide surface decreases, thus increasing the material conductance (for n-type semiconductors).

Oxidizing gases, such as NO2 and O3, are reduced by the interaction with the oxide surface and, as a consequence, the population of oxygen ions increases as does the material resistance (for n-type semiconductors).Despite their qualitative nature, these arguments are effective to explain the basic ideas underlying the strategies adopted to design and optimize metal oxide layers for conductometric gas sensors. Several approaches have been adopted to develop highly performing metal oxide layers, which can be grouped into two ideal structures, named as thin-film and thick-film, according to the main preparation techniques typically adopted to prepare layers with these structures.

The thin film Batimastat approach exploits a compact layer with thickness as close as possible to the space charge layer width (W). In the abrupt approximation, the macroscopic conductance of this structure is described by a non-conducting layer of thickness W, located at the outermost surface, and a conducting layer below it, having thickness z0-W. A schematic representation is provided in Figure 1. It is evident from this picture that sensitivity is optimized by reducing the film thickness at values close to W, so that the SCL extends through the whole film.Figure 1.Schematic representation of the structure Brefeldin_A (a) and working principle (b) of thin film gas sensors.

The advantage of the thin film approach is the reproducibility, thanks to its simple geometry that does not involve percolative paths for electrical conduction (which occur in thick films). On the other hand, it features a limited surface area, close to the geometrical area, enhanced by a relatively small factor depending on the surface roughness. This limits the sensitivity of the device with respect to performance obtained with thick-film technology.

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